Wafer processing machine

ABSTRACT

Centrifugal processing machine for spray processing wafers of silicon and the like the machine having a processing chamber closed by a door and having a generally horizontal orientation with the rotor also substantially horizontally oriented. The peripheral sidewall of the process chamber has an offset defined by overlapping edge portions defining a circumferentially facing drainage slot, facing in the same direction as the rotor revolves; the process chamber being maintained under slightly positive pressure above atmospheric pressure to the extent of about 10 to 12 inches of water; the transparent door panel having a groove at the inner face of the door panel and traversing of the transparent panel from its center in radial directions oblique to each other, and an adjoining dry nitrogen nozzle directing a spray of nitrogen across the inner face of the transparent door panel and across one end of the groove in the door panel.

This is a divisional of co-pending application Ser. No. 06/759.426 filedon 7/26/85.

This invention relates to machine for centrifugal processing of siliconwafers in the manufacture of integrated circuit chips

BACKGROUND OF THE INVENTION

In processing of such silicon wafers and the like the wafers aresubjected to numerous process steps involving highly active liquidchemicals such acids and rinsing water, and gases which are generallyused in drying the wafers between other process steps. Such liquids andgases are often applied by spraying onto the wafers in such centrifugalspray processing. The wafers are revolved in a closed processingchamber.

Processing machines defining such a process chamber are typicallyarranged with a wafer carrying rotor revolving on an upright axis,substantially as illustrated in U.S. Pat. Nos. 4,132,567 and 3,990,462.The housing defining the process chamber provides a drain in the bottomof the housing through which liquids and some gases are drained orevacuated from the chamber.

In other processing machines, the wafer carrying rotor may be arrangedto revolve on a generally horizontal axis or on an axis inclined by afew degrees above the horizontal. In such a machine, as illustrated inU.S. Pat. No. 4,300,581, the liquid drainage and discharge of the gasesoccurs at the lower side of the generally cylindrical wall of thehousing defining the process chamber. In that patent, the lowermostportion of the cylindrical peripheral wall simply has a slot extendingparallel to the axis, and a drainage collector at the outside of thehousing connects to a drain pipe for discharging the liquids and gases.

It has been found that the removal of all of the droplets of liquid fromthe walls of the processing chamber is difficult to accomplish with theequipment known previously. The droplets of rinsing water often remainon the peripheral wall of the chamber and on the inside face of thedoor, on the drying cycle in the processing machine is continued so longas to evaporate the liquid droplets. Previously, doors have incorporateda heating devices ask to vaporize liquid droplets which may collectthereon, but the use of such heating devices in the door is notpractical in such doors that may incorporated a transparent panel.

SUMMARY OF THE INVENTION

An object of the invention is to minimize or prevent the collection ofdroplets of liquid on the inner peripheral wall and door of acentrifugal wafer processing machine, and particularly such a machinewhich is generally horizontally oriented with the axis of the rotor in agenerally horizontal orientation.

Another object of the invention is to minimize the possibility ofmigration of ambient air and particulate that may be carried by the air,into the process chamber of a centrifugal wafer processing machine, therotor of which revolves at high speed during certain functional cyclesof the machine.

A feature of the invention is the provision in the peripheral sidewallof a generally horizontally oriented centrifugal spray processingmachine for silicon wafers and the like, of a drain defined between thecircumferential extending and overlapped edge portions of the sidewallspaced from each other and defining a drain slot between said edgeportions and facing circumferentially of the the peripheral wall. Therotor in the processing chamber revolving in the same circumferentialdirection as the drain slot faces.

One of the circumferentially extending and overlapped edge portions hasa multiplicity of deformations engaging the other edge portionmaintaining the drain slot in a uniformly open condition along thelength of the slot.

It has been found that under normal operating conditions of the sprayprocessing machine, wherein the rotor is rapidly revolved during theportions of the cycle wherein the liquids are to be drained and thegases in the process chamber are to be vented through the drain slot,water droplets in the vicinity of the drain will quickly disappear andthe moisture therefrom will be carried to the drain slot and out of theprocess chamber. Normally, a slight positive pressure in the range often inches to twelve inches of water is maintained in the processchamber during the evacuation of the liquids and gases and removal ofthe water droplets, but the removal of water droplets from the surfaceof the housing and peripheral wall is also satisfactory without the useof such pressure in the chamber.

The drain thus provided for discharging both liquids and gases from thechamber provides the advantage of assuring that all of the liquiddroplets are removed from the surface of the chamber wall and thisminimizes the likelihood of the migration of any moisture droplets backon to the wafers which are being processed and carried by the rotor.

Another feature of the invention relates to the removal of liquiddroplets from the inside surface of the transparency panel of the doorat the end of the process chamber wherein the rotor is on an axisoriented generally horizontally or a few degrees off from horizontal.The door or panel is provided with a shallow groove on its inner faceand confronting the process chamber. The groove has opposite endportions, both extending from a central location on the panel which isintersected by the axis of the rotor, but the said end portions of thegrooves extend obliquely with respect to each other. A nozzle for drynitrogen is mounted on the housing sidewall, adjacent one end of theshallow groove of the panel, and the nozzle directs a spray of gaseousnitrogen though the process chamber and transversely across the door orpanel.

It has been found that with this arrangement, the water droplets whichotherwise tend to collect on the door panel are quickly disposed ofduring the drying cycle of the process machine, during which the rotoris rapidly revolved as the dry nitrogen gas is directed inwardly of theprocess chamber and across the grooved panel. The result is that afterthe completion of the drying cycle, no visible water droplets remain onthe door panel, nor are the water droplets visible in the groove whichtraverses the panel.

Another feature of the invention relates to the conducting of theprocess cycle under slight pressure in the process chamber. Thispressure assists in discharging waste liquids and gases through thedrain slot; and the pressure also tends to minimize the formation of thevacuum conditions between the baseplate of the turntable and theadjacent of the process chamber and thereby minimize the migration ofthe air and possible particulates carried thereby through the bearingand seal mounting of the rotary shaft in the end of the housing forsupporting and revolving the turntable.

The advantaged obtained is the minimizing of a particulate in theprocessing chamber and the elimination of one more source of particulateas to prevent any contamination of the wafers being processed

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a side elevation view of the processing machine, with portionsof the housing broken away for clarity of detail.

FIG. 2 is a front elevation view of the processing machine, with aportion thereof broken away for clarity of detail.

FIG. 3 is an enlarged detailed action view taken approximately at 3--3of FIG. 1.

FIG. 4 is an enlarged detailed section view taken approximately at 4--4of FIG. 3.

FIG. 5 is detailed section view taken approximately at 5--5 of FIG. 4.

FIG. 6 is a detailed section view taken approximately at 6--6 of FIG. 1.

FIG. 7 is an enlarged detailed section taken approximately at 7--7 ofFIG. 6.

DETAILED SPECIFICATION

One form of the invention is illustrated in the drawing and is describedherein.

The centrifugal processing machine is indicated in general by 10, andthe machine is provided with a frame structure a 11 upon which ismounted a bowl shaped housing 12, and a drive motor 13 mounted in asubstantially horizontal position so that the rotation axis 14 of themotor 13 is oriented nearly horizontally, but slightly at an angle withthe horizontal of approximately 5 to 10 degrees. The housing 12 has abase wall 15, and a substantially cylindrical peripheral sidewall 16formed integrally of the base wall 15, or welded thereto. The housing 12defines a generally cylindrical interior processing chamber 17. Theperipheral sidewall 16 has an open front defining an access opening 18,and the access opening is normally closed by a swingable door 19 andmounted on a hinge structure 20 to the front panel 21 and frame of themachine. The opening 18 and door 19 provide access means into theprocessing chamber.

The door 19 has a peripheral frame panel 22 with a generally rectangularshape and is secured to the hinge structure 20. The frame panel 22 ofthe door has a central opening 23 to permit the visual access throughthe door 19. A transparent panel 24 of polycarbonate plastic or othersimilar transparent plastic material, lies against the frame panel 22 ofthe door at its inner side, and traverses the opening 23. Thetransparent panel 24 is affixed to the frame panel 22 by screws 25. Therim 26 on the front of the open end of the peripheral sidewall 16 sealsagainst the periphery of the transparent pane1 24 and is sealed thereagainst as by a O-ring which extends around the periphery of thetransparent door panel 24. A handle 27 is affixed to the frame panel 22of the door to accommodate the opening and closing of the door.

A rotor indicated in general by a 28 is connected with the shaft 29 ofthe motor 13 which extends through the opening 15.1 in the base wall 15and into the housing to be driven by the shaft. The turntable 28 has abase 28.1 of which lies in confronting, but the spaced relation with thebase wall 15 of the housing. A seal 29.1 between the rotor 28 and thebase wall of the housing minimize and substantially prevents air leakageinto or out of the housing. The rotor also includes a frame structure 30to mount a wafer carrier 31 which carries a multiplicity of siliconwafers 32 substantially concentrically of the center line 14 and in thespace relation with each other. The wafer carrier 31 may be as seen inU.S. Pat. No. 4,471,716. The frame structure 30 and wafer carrier 31provide numerous openings so that liquid sprays and gases directed intothe processing chamber 17 have access to the wafers 32 for processingthe wafers.

A manifold nozzle 33 is mounted on the outside of the peripheralsidewall 16 of the housing. Nozzle 33 is connected to sources of processliquids and gases under pressure and directs such liquid and gaseoussprays, inwardly into the process chamber 17 through the multiplicity ofspray ports 34 spaced along one length of sidewall 16. Liquids such asrinsing water, and in some cases wafer processing acids and otherchemicals will be directed from the manifold nozzle 33 into the processchamber and onto the wafers. Gases such as dry nitrogen will also bedirected into the processing chamber from the manifold nozzle 33 andthrough the spray ports 34 and for drying the interior of the processingchamber and the wafer 32 being processed and for establishing a positivepressure in the processing chamber 17. Such processing liquids and gasesare supplied in such sequences as the processing may determine, and arecontrolled by valves in the flow lines.

Another nozzle 35 is mounted on the exterior of the housing sidewall 16adjacent the door 19 and is also connected to a supply of dry nitrogenunder pressure. Nozzle 35 directs dry nitrogen into the processingchamber 17 through a spray port 36. It will be recognized that the drynitrogen is sprayed, as indicated at 35.1 inwardly of the processingchamber and traversing across the inner surface of the transparent doorpanel 24. Supply of nitrogen to nozzle 35 is controlled by valves in theflow lines, and the nitrogen is sprayed from nozzle 35 during the dryingphase of operating cycle of the machine.

The transparent door panel 24 has an elongate groove 37 therein andlocated at the inner face 38 of the transparent panel 24 as to face intothe processing chamber 17. The elongate groove 37 is seen in FIGS. 2, 6and 7, and extends across the transparent panel with its opposite endportions 37.1 and 37.2 extending generally radially and linearly fromthe center or central portion of the panel 24 and outwardly into spacedrelation with the outer periphery of the panel. It will be recognizedthat the opposite end portions of 37.1 and 37.2 of the groove extendobliquely of each other at an obtuse angle formed at the center of thepanel 24 and substantially in alignment with the center line 14 of themotor 13 and the rotor 28. The end portion of 37.1 is disposedimmediately adjacent the nozzle 35, the dry nitrogen from whichtraverses the and portion of 37.1 of the groove.

A drain apparatus, indicated in general by numeral 39 is provided at thelower side of the housing 12 and at the lower portion of the peripheralsidewall 16 thereof.

The lower portion of the peripheral wall 16 lies substantially parallelto the axis 14, and has a pair of circumferentially extending edgeportions 40 and 41 which are arranged in overlapping relation with eachother. The overlapping edge portions 40 and 41 are maintained in spacedrelation to with each other to define a drainage slot 42 there between.The inner edge portion 40 of the peripheral sidewall has spaced means inthe form of a multiplicity of dimple shaped deformations or undulations43 formed therein as to lie against the edge portion 41 and assure thatthe drainage slot 42 is maintained in open condition all along thelength of the sidewalls 16 between the ends thereof. Each of the dimpleshaped deformations 43 is spot welded to the adjacent edge portion 41against which the deformation 42 of 43 bears.

The drainage slot 42, although in a multiplicity of short segmentsbetween the dimple shaped deformations 43, functions as a continuousdrainage slot for discharging all of the liquids and gaseous fluids fromthe processing chamber.

At the outer side of the peripheral sidewall 16, adjacent theoverlapping edge portions 40 and 41, a generally semi-circular shroud 44encloses the overlapping edge portions and drainage slot 42 and iswelded to the housing sidewall 16 to receive and carry away the drainageliquids and exhaust gases being discharged from the process chamber. Theshroud 44 takes the form of a conduit or duct 44.1 at the base wall ofthe housing to continue to carry away the fluids discharged from theprocessing chamber. The duct 44.1 is connected to a liquid drain and toa vent or stack to dispose of exhaust gases from the process chamber 17.

The motor 13 revolves the turntable 28 and the wafers 32 in thedirection indicated by arrow A as seen in FIGS. 2, 3 and 6. It will berecognized that the inner edge portion of 40 of the peripheral sidewall16 extends circumferentially in the same direction as the direction ofrotation of the rotor as indicated by arrow A over the other edgeportion 41 of the sidewall. The overlapping edge portions 40 and 41 ofthe sidewall define an offset in the sidewall 16 with the drainage slot42 facing circumferentially of the peripheral sidewall 16 and facing inthe same direction as indicated by arrow A which is the direction ofrotation of the rotor 28. The drainage slot extends substantiallylinearly, and parallel to the rotation axis 14.

The direction of rotation as indicated by arrow A is also related to thepositioning of the nozzle 35 in relation to the outer end portion of37.1 of the groove 37 in the transparent panel 24. The end portion 37.1of the groove is spaced circumferentially in the direction of arrow Afrom the spray port 36 in the peripheral wall adjoining the nozzle 35.

The manifold nozzle 33 and the dry nitrogen nozzle 35 are combined tosupply gas under pressure into the processing chamber 17, and normallythe pressure in the processing chamber 17 is maintained at a slightpositive pressure above atmospheric pressure. Ordinarily about 10 inchesto 12 inches of water pressure is maintained in the processing chamber.

The pressure in the chamber, taken together with the rapid movement ofthe gases and liquids in the chamber during the rinsing and drying stepsof the process cycle produce the rapid flow of fluids being dischargedthrough the drainage slot 42 of the drain apparatus 39. The effect ofthe offset in the peripheral sidewall produced by the overlapping edgeportions 40 and 41 and the circumferentially facing drainage slot 42,together with the rapid rotation of turntable 28 to speeds of up to3,000 rpm, and the positive pressure in the process chamber 17, is thatall of the water droplets on the inner face of the peripheral sidewallare disposed of in such a matter that the water droplets will disappearquickly and be carried as vapor out of the housing and through thedrainage slot and into the drain shroud and conduit 44.

The pressure maintained in the processing chamber also has the effect ofminimizing or preventing the creation of any vacuum pressure between thebase 28.1 of the rotor and the adjacent bottom wall 15 of the housing.Ordinarily this rapidly revolving base 29 confronting the base wall 15of the housing will produce a vacuum pressure there between, tending todraw air through the base wall adjacent the shaft and certainparticulate or contaminates with the air for producing a contaminatedatmosphere within the processing chamber 17. However with the positivepressure in the chamber as described, the tendency to form a vacuumbetween the base 28.1 and the bottom wall 15 of housing is prevented orminimized and ingress of air with particulate is prevented or minimized.

During the drying cycle of the processing machine, and with the rotor 28the continuing to revolve at high speeds, such as in the range of 3,000rpm, the spraying of dry nitrogen from a nozzle 35, and traveling acrossthe transparent panel 24 and across the groove 37 quickly produces theelimination of water droplets on the inner face 38 of the transparentpanel. The particular reason for the elimination of water droplets fromthe inner face 38 from the transparency panel is not fully understood,but through observations made during the operation of the machine 10,the removal of the water droplets from the face 38 is rapid and visuallydiscernable. Liquid droplets which would ordinarily movecircumferentially on the face of the panel 24 appear to be eliminated asthey encounter the groove 37; and it also appears as though substantialquantities dry nitrogen gas from the nozzle 35 travel rapidly along thegroove 37 to encounter the water droplets that may approach and enterthe groove. In any event, the end portions of the groove 37 at the innerface of the panel 24 disposes of all visible liquid droplets on thetansparent panel 24 so as to minimize the possibility of any liquidreturning onto the wafers 32 in the chamber.

That which is claimed;
 1. A centrifugal processing machine for sprayprocessing silicon wafers and the like in the manufacture of integratedcircuit chips, comprisinga housing defining a processing chamber andhaving rotor means in the chamber to mount and revolve such wafers abouta rotation axis, the housing having means supplying and dischargingprocess liquids and gases into and from the processing chamber, and thehousing also having a peripheral wall extending along the axis andhaving an access door traversing the rotation axis and accommodatinginsertion and removal of such wafers for loading and unloading the rotormeans, the door having a door panel with an inner face confronting theend of the rotor means in spaced relation therewith, and the door panelhaving an elongate groove through the inner face thereof and extendingacross the panel to the edge portions thereof, and a gas nozzle adjacentthe peripheral wall and door panel and directing a spray of dry gas intothe processing chamber and across the door panel and the groove therein,the spray of dry gas and the groove cooperating to eliminate liquiddroplets on the inner face of the door panel.
 2. centrifugal processingmachine according to claim 1 wherein the door panel is transparent.
 3. Acentrifugal processing machine according to claim 1 wherein theperipheral wall has an and defining an access opening traversed by thedoor panel.
 4. A centrifugal processing machine according to claim 1wherein the door panel has a central portion adjacent one end of therotor axis, said elongate groove traversing said central portion havingend portions extending obliquely with respect to each other.
 5. Acentrifugal processing machine according to claim 4 and the gas nozzlebeing adjacent one end portion of the elongate groove and directing gasto traverse the door panel adjacent the said one end of the groove.
 6. Acentrifugal processing machine according to claim 5 wherein the rotormeans revolves in one direction, said one end of the groove being spacedfrom the gas nozzle, in said one direction.
 7. A centrifugal processingmachine according to claim 4 wherein the end portions of the elongategroove extend to substantially linearly and have an angular relation toeach other adjacent the center of the door panel.
 8. A centrifugalprocessing machine according to claim 1 wherein the ends of the elongategroove are in spaced relation to the periphery of the door panel.